Overview

The AVS 27th International Conference on Atomic Layer Deposition (ALD 2027) featuring the 14th International Atomic Layer Etching Workshop (ALE 2027) will be a three-day meeting dedicated to the science and technology of atomic layer controlled deposition of thin films and atomic layer etching.  Since 2001, the ALD conference has been held alternately in the United States, Europe and Asia, allowing fruitful exchange of ideas, know-how and practices between scientists. The conference will take place Sunday, June 20-Wednesday, June 23, 2027, Dresden, Germany.

As in past conferences, the meeting will be preceded (Sunday, June 20) by one day of tutorials and perspectives and a welcome reception. Sessions will take place (Monday-Wednesday, June 20-23) along with an industry tradeshow. All presentations will be audio-recorded and provided to attendees following the conference (posters will be included as PDFs). Anticipated attendance is 700+. View List of Invited Speakers

Abstract Submission

Program Chair:
Anjana Devi
(Leibniz Institute, IFW Dresden, Germany)

Program Co-Chair:
TBD
(TBD)

Program Chair:
TBD
(TBD)

Program Co-Chair:
TBD
(TBD)